Tutorials

• Benchmarks from original paper
  • A. Automated design for a given critical diameter
  • B. Beam-I pillars with no special boundary treatment
  • C. Rectangular pillars with boundary treatment pow_2
  • D. Triangular pillars with boundary treatment pow_3
  • E. Parallelized DLD units with through-wafer vias
• Benchmarks from original paper (ESI)
  • Adding a preload upstream of device
  • Adding a filter upstream of device
  • Adding collection channels downstream of device
  • Adding preload and filter upstream and collection channels downstream of device
  • Adjusting the length of filter upstream of device
  • Adjusting the preload dimensions
  • Adjusting the lateral and axial offsets of preload entities
  • Mirrored design
  • Mirrored design without cap
  • Adjusting the sidewall width
  • Adjusting the tone of layout
  • Arraying DLD structures
  • Arraying DLD structures with mirrored design
  • Mirroring following by arraying of DLD structures
  • Mirroring following by arraying of DLD structures while adjusting spacing between mirrors/copies.
  • Boundary treatment 3d
  • Boundary treatment 3d - adjusting resistance ratio
  • Boundary treatment pow
  • Boundary treatment pow - adjusting power value
  • User-defined pillars profile
  • Rotation of pillars
  • Theme: Multistage
  • Theme: Condenser-and-Sorter
  • Multi-inlet
  • Multi-inlet with non-uniform widths